Spin Coater
용 도
Spin Coater는 TiO2 등 광촉매(Photocatalysts)를 ITO, FTO glass 기판에 입힌 후에, 최대 12,000rpm의 속도로 기판을 회전시켜 얻어지는 원심력으로, 균일한 두께의 반도체 박막을 형성하는데 사용하는 장비입니다.
DESCRIPTION
The Spin Coater is typically used for the application of a thin layer. The flexible nature of this piece of equipment allows users to experiment with the application of other cell components varying the spinning parameters in a very precise controllable manner.
Controllable acceleration time, spin speed and deceleration time allow for precise and repeatable depositions. The chemically inert materials of the internal chamber ensures no contamination of the Perovskite & DSC solar cells.
The Laurell’s Spin coater is the best choice for Perovskite research because it is optimized for use with Perovskite material sets. Different models available with different spin parameters and substrates thicknesses.
BENEFITS
Designed specifically for ease-of-use
Simple to program from the operator panel or your PC
Ability to allow process inputs from external sources
Designed specifically for continuous process development
Operational statistics stored continuously & permanently